Abstract
Transparent and conductive Ti-doped In₂O₃ (TIO)/Ag/Ti-doped In₂O₃ (TAT) multilayer films were deposited on colorless poly imide (CPI) substrates by direct current (DC) and radio frequency (RF) magnetron sputtering at room temperature. During deposition the thickness of both the top and bottom TIO layer was fixed at 30 nm, while the..... More

Abstract
Transparent and conductive Ti doped In₂O₃ (TIO) films were prepared on slide glass substrate using a radio frequency (RF) magnetron sputter and then subjected to Transparent and conductive Ti doped In₂O₃ (TIO) films were prepared on a glass slide substrate using radio frequency (RF) magnetron sputter. The film surface was..... More

Abstract
Transparent conductive ZnO 50 nm/Ag 10 nm/SnO₂ 50 nm (ZAS) tri-layer films were deposited on glass substrates by magnetron sputtering, and then the surface was subjected to intense electron beam irradiation to investigate the effects of electron irradiation on the structural, optical, and electrical properties of the films. After deposition,..... More

Abstract
ZnO 50 nm/Ag 10 nm/SnO₂ 50 nm (ZAS) tri-layer films were deposited on a glass substrate by RF and DC magnetron sputtering and then underwent rapid thermal annealing in a low vacuum of 1×10^-3 Torr to investigate the effects of post-deposition annealing on the optical and electrical properties of the..... More

Abstract
ZnO/Ag/SnO2 (ZAS) tri-layer films were prepared on glass substrates via RF and DC magnetron sputtering, and then the influence of the thickness of the ZnO and SnO2 layers on the optical and electrical properties of the ZAS films was investigated. As deposited ZnO 50 nm/Ag 10 nm/SnO2 50 nm films..... More