Abstract
Cr_25.2Al_19.5Si_4.7N_50.5 thin films were deposited on steel substrates by cathodic arc plasma deposition. They consisted of alternating fcc-Cr(Al)N/hcp-Al(Cr,Si)N nanolayers. They were corroded at 900 and 1000 ^oC for 5-100 h in N₂/0.1%H₂S gas atmosphere. Their corrosion mechanism, the structure of the formed scales, and the role of film-constituting elements during..... More