| Home | E-Submission/Review | Sitemap | Editorial Office |  
top_img
Korean Journal of Metals and Materials Search > Browse Articles > Search



Thickness Dependence of Cu-layer-based Transparent Heaters
Cu 박막의 두께 변화에 따른 면상발열체 특성 연구
Dooho Choi
최두호
Korean J. Met. Mater. 2022;60(7):511-516.   Published online 2022 Jun 3
DOI: https://doi.org/10.3365/KJMM.2022.60.7.511

Abstract
In this study, ultrathin (4-40 nm) Cu-layer-based transparent heaters prepared on glass substrates were investigated for cost-effective applications. The Cu heaters were embedded between ZnO layers serving as anti-reflection and anti-corrosion layers. The Cu layer thicknesses varied in the range of 4-40 nm, and the corresponding structural, electrical, optical and..... More

                        
Fabrication of Semi-transparent W film Heaters via Phase Transformation
텅스텐 나노박막의 상변태를 이용한 반투명 면상발열체 형성 연구
Jiyun Choi, Dooho Choi
최지윤, 최두호
Korean J. Met. Mater. 2021;59(9):664-669.   Published online 2021 Aug 4
DOI: https://doi.org/10.3365/KJMM.2021.59.9.664

Abstract
In this study, we prepared highly thermostable semi-transparent heaters composed of W layers with thicknesses of 1-20 nm, on which a 30 nm-thick ZnO layer was deposited to serve as an anti-oxidation barrier. The optical transmittance and sheet resistance of the heaters could be greatly modulated by varying the W..... More

                           Cited By 1
Simultaneous Improvement in the Corrosion Resistance and Visible Transparency of ZnO/Cu/ZnO Transparent Heaters with Reactively Sputtered Al2O3 Layers
반응성 스퍼터링법으로 제조된 Al2O3 막을 이용한 ZnO/Cu/ZnO 투명 히터의 내식성과 투과도 개선 연구
Geumhyuck Bang, Dooho Choi
방금혁, 최두호
Korean J. Met. Mater. 2021;59(3):155-161.   Published online 2021 Feb 19
DOI: https://doi.org/10.3365/KJMM.2021.59.3.155

Abstract
In this study, we report a methodology that simultaneously improved the corrosion resistance and visible transparency of ZnO/Cu/ZnO transparent heaters with the addition of reactively sputtered Al2O3 layers. To assess corrosion resistance, ZnO and Al2O3 layers with thicknesses in the range of 0-20 nm were deposited onto 20 nm-thick Cu..... More

                           Cited By 2
Deposition of Low-Resistivity Aluminum Thin Films Via Application of Substrate Bias During Magnetron Sputtering
기판 바이어스와 스퍼터 압력 조절을 통한 저저항 알루미늄 박막 형성 연구
Dooho Choi
최두호
Korean J. Met. Mater. 2020;58(10):715-720.   Published online 2020 Oct 5
DOI: https://doi.org/10.3365/KJMM.2020.58.10.715

Abstract
In this study, the critical role of substrate bias during the sputter deposition of Al thin films is discussed. Two sets of Al thin films having a nominal thickness of 300 nm were deposited at sputtering pressures of 4.1 and 1.5 mTorr, respectively, with an applied negative substrate bias in..... More

                           Cited By 1
Optimization of ZnO/Cu/ZnO Flexible Transparent Conductive Electrodes Fabricated by Magnetron Sputtering
마그네트론 스퍼터링법으로 제조된 ZnO/Cu/ZnO 유연 투명전극 성능 최적화 연구
Daekyun Kim, Taehyeong Lee, Dooho Choi
김대균, 이태형, 최두호
Korean J. Met. Mater. 2019;57(12):795-800.   Published online 2019 Nov 22
DOI: https://doi.org/10.3365/KJMM.2019.57.12.795

Abstract
With the expanding development of flexible optoelectronic devices, the need for high-performance (i.e., high conductivity, high transmittance and flexibility) transparent conductive electrodes has grown. In this study, the critical role of thickness for each of the layers in ZnO/Cu/ZnO transparent conductive electrodes (TCE) for optoelectronic devices has been investigated. The..... More

                           Cited By 5
Optimization of ZnO/Ag/ZnO Transparent Conductive Electrodes Fabricated by Magnetron Sputtering
스퍼터링법으로 증착된 ZnO/Ag/ZnO 투명전극의 성능 최적화 연구
Woo Hyeon Jo, Dooho Choi
조우현, 최두호
Korean J. Met. Mater. 2019;57(2):91-96.   Published online 2019 Jan 11
DOI: https://doi.org/10.3365/KJMM.2019.57.2.91

Abstract
The critical role of the thicknesses of the top and bottom oxide layers, as well as Ag layer, in ZnO/Ag/ZnO transparent conductive electrodes were investigated. The Ag forms a nearly continuous layer at the thickness of 8 nm, at which the Ag sheet resistance of 8.0 Ω/Sq. is lower than..... More

                           Cited By 9
Potential of Ruthenium and Cobalt as Next-generation Semiconductor Interconnects
Ru와 Co의 차세대 반도체 배선 적용성 연구
Dooho Choi
최두호
Korean J. Met. Mater. 2018;56(8):605-610.   Published online 2018 Aug 5
DOI: https://doi.org/10.3365/KJMM.2018.56.8.605

Abstract
Severe resistivity size effect in Cu interconnects is attributed to the relatively long bulk electron mean free path (39 nm at 298 K), which is inherently determined by phonon scattering. In this regard, Ru and Co have been recently considered as attractive alternatives for next-generation interconnect materials because the significantly..... More

                           Cited By 3
1 |
E-Submission
Email Alert
Author's Index
Specialties
Impact factor
The Korean Institute of Metals and Materials
SCImago Journal & Country Rank
Scopus
GoogleScholar
Similarity Check
Crossref Cited-by Linking
KOFST
COPE
Editorial Office
The Korean Institute of Metals and Materials
6th Fl., Seocho-daero 56-gil 38, Seocho-gu, Seoul 06633, Korea
TEL: +82-2-557-1071   FAX: +82-2-557-1080   E-mail: metal@kim.or.kr
About |  Browse Articles |  Current Issue |  For Authors and Reviewers
Copyright © The Korean Institute of Metals and Materials.                 Developed in M2PI