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Effect of Side Lobe Intensity and Photon Shot Noise Effect on the Missing Hole Phenomenon in Extreme Ultraviolet Lithography
극자외선 노광공정에서의 사이드 로브 세기와 포톤 샷 노이즈 효과가 컨택 홀 missing 현상에 미치는 영향
Jung Sik Kim, Seongchul Hong, Yong Ju Jang, Jinho Ahn
김정식, 홍성철, 장용주, 안진호
Korean J. Met. Mater. 2017;55(2):139-143.   Published online 2017 Feb 2
DOI: https://doi.org/10.3365/KJMM.2017.55.2.139

The missing hole phenomenon in a wafer pattern is a critical issue in extreme ultraviolet lithography. It occurs randomly, even when the process conditions are consistent. The main reason for this phenomenon is thought to be the photon shot noise effect, which is a random reaction between photons and photoresist..... More

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