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Thickness Dependence of Cu-layer-based Transparent Heaters
Cu 박막의 두께 변화에 따른 면상발열체 특성 연구
Dooho Choi
Korean J. Met. Mater. 2022;60(7):511-516.   Published online 2022 Jun 3
DOI: https://doi.org/10.3365/KJMM.2022.60.7.511

In this study, ultrathin (4-40 nm) Cu-layer-based transparent heaters prepared on glass substrates were investigated for cost-effective applications. The Cu heaters were embedded between ZnO layers serving as anti-reflection and anti-corrosion layers. The Cu layer thicknesses varied in the range of 4-40 nm, and the corresponding structural, electrical, optical and..... More

Enhanced Electrical Performance and Bias Stability of a-IGZO Thin-Film Transistor by Ultrasonicated Pre-annealing
초음파 전열처리를 이용한 a-IGZO 트랜지스터의 향상된 전기적 성능과 바이어스 안정성
Jae-Yun Lee, Suchang Yoo, Han-Lin Zhao, Seong-Gon Choi, Heung Gyoon Ryu, Yong Jin Jeong, Sung-Jin Kim
이재윤, 유수창, 조한림, 최성곤, 유흥균, 정용진, 김성진
Korean J. Met. Mater. 2022;60(4):307-314.   Published online 2022 Mar 28
DOI: https://doi.org/10.3365/KJMM.2022.60.4.307

Vacuum-processed oxide semiconductors have enabled incredible recent advances in the scientific research of metal oxide thin-film transistors (TFTs) and their introduction in commercial displays. Developing metal oxide transistors with low processing temperatures, on the other hand, remains a challenge. Metal oxide transistors are commonly produced at high processing temperatures (over..... More

Fabrication of Semi-transparent W film Heaters via Phase Transformation
텅스텐 나노박막의 상변태를 이용한 반투명 면상발열체 형성 연구
Jiyun Choi, Dooho Choi
최지윤, 최두호
Korean J. Met. Mater. 2021;59(9):664-669.   Published online 2021 Aug 4
DOI: https://doi.org/10.3365/KJMM.2021.59.9.664

In this study, we prepared highly thermostable semi-transparent heaters composed of W layers with thicknesses of 1-20 nm, on which a 30 nm-thick ZnO layer was deposited to serve as an anti-oxidation barrier. The optical transmittance and sheet resistance of the heaters could be greatly modulated by varying the W..... More

                           Cited By 1
Deposition of Low-Resistivity Aluminum Thin Films Via Application of Substrate Bias During Magnetron Sputtering
기판 바이어스와 스퍼터 압력 조절을 통한 저저항 알루미늄 박막 형성 연구
Dooho Choi
Korean J. Met. Mater. 2020;58(10):715-720.   Published online 2020 Oct 5
DOI: https://doi.org/10.3365/KJMM.2020.58.10.715

In this study, the critical role of substrate bias during the sputter deposition of Al thin films is discussed. Two sets of Al thin films having a nominal thickness of 300 nm were deposited at sputtering pressures of 4.1 and 1.5 mTorr, respectively, with an applied negative substrate bias in..... More

                           Cited By 1
Measurement of Intrinsic Hardness of Deposited Chromium Thin Films by Nanoindentation Method and Influencing Factors
나노인덴테이션 방법으로 크롬 박막의 고유경도를 측정하는 방법과 영향 인자
Young-Joon Kang, Ju-Hwan Baeg, Hyun Park, Young-Rae Cho
강영준, 백주환, 박현, 조영래
Korean J. Met. Mater. 2020;58(3):207-215.   Published online 2020 Mar 5
DOI: https://doi.org/10.3365/KJMM.2020.58.3.207

Materials with very small dimensions exhibit different physical and mechanical properties compared to their bulk counterparts. This becomes significantly important for the thin films that are widely used as components in micro-electronics and functional materials. In this study, a chromium (Cr) thin film was deposited on a silicon (Si) wafer..... More

                           Cited By 2
Synthesis of MgF<sub>2</sub> Nanoparticles for Improved Anti-Reflective Coating
무반사 코팅을 위한 MgF2 나노입자 합성과 박막 부착력 향상을 위한 연구
Byung-Kwan Song, Jae-Yong Jung, Young-Rae Cho, Jong-Joo Rha, Jeong Wan Kim, Young-Kuk Kim
송병관, 정재용, 조영래, 나종주, 김정완, 김영국
Korean J. Met. Mater. 2020;58(3):201-206.   Published online 2020 Feb 3
DOI: https://doi.org/10.3365/KJMM.2020.58.3.201

Anti-reflective (AR) coatings are popular because they offer high durability with effective reflectance and glare reduction, and they can endure both physical and environmental damage. Magnesium fluoride (MgF2) has been used as a nanoparticle coating on AR coating materials by many researchers because they exhibit high transmittance and antireflection characteristics..... More

                           Cited By 1
The Effect of Post Annealing on Physical Properties of NiTe<sub>2</sub> Thin Film Fabricated by Magnetron Sputtering
후열처리 공정이 스퍼터링법으로 제조된 NiTe2 박막의 물리적 성질에 미치는 영향
Ho Jun Park, Jun Ho Lee, Byeong Uk Min, Suk Jun Kim
박호준, 이준호, 민병욱, 김석준
Korean J. Met. Mater. 2020;58(3):195-200.   Published online 2020 Mar 5
DOI: https://doi.org/10.3365/KJMM.2020.58.3.195

In this study, the effect of post annealing time on the physical properties of NiTe2 thin films with 2D structure deposited by co-sputtering was investigated. After heat treatment for 10 min, nickel ditelluride thin films with a composition of Ni : Te = 1 : 2 exhibited transmittance of 46%..... More

                           Cited By 3
Influence of Alloy Content on Microstructure and Corrosion Resistance of Zn-based Alloy Coated Steel Product
Zn계 합금도금재의 미세구조 및 내식성에 미치는 합금 조성 변화 영향
Jae-Won Lee, Sung-Jin Kim, Min-Suk Oh
이재원, 김성진, 오민석
Korean J. Met. Mater. 2020;58(3):169-174.   Published online 2020 Mar 5
DOI: https://doi.org/10.3365/KJMM.2020.58.3.169

The effects of alloy composition on the coating structure and corrosion resistance of hot-dip Znbased alloy coated steel products were investigated. Zn-based alloy coating layers with different Al and Mg compositions were fabricated using a batch-type galvanizing simulator. Various intermetallic compounds including Zn, Zn/MgZn2 binary eutectic, Zn/Al binary eutectoid and..... More

                           Cited By 2
Optimization of ZnO/Cu/ZnO Flexible Transparent Conductive Electrodes Fabricated by Magnetron Sputtering
마그네트론 스퍼터링법으로 제조된 ZnO/Cu/ZnO 유연 투명전극 성능 최적화 연구
Daekyun Kim, Taehyeong Lee, Dooho Choi
김대균, 이태형, 최두호
Korean J. Met. Mater. 2019;57(12):795-800.   Published online 2019 Nov 22
DOI: https://doi.org/10.3365/KJMM.2019.57.12.795

With the expanding development of flexible optoelectronic devices, the need for high-performance (i.e., high conductivity, high transmittance and flexibility) transparent conductive electrodes has grown. In this study, the critical role of thickness for each of the layers in ZnO/Cu/ZnO transparent conductive electrodes (TCE) for optoelectronic devices has been investigated. The..... More

                           Cited By 5
Effect of Rapid Thermal Annealing Temperature on Oxygen-Deficient TiO<sub>2-x</sub>-based Thin-Film Transistors Deposited by RF Magnetron Sputtering
RF 마그네트론 스퍼터링으로 증착한 산소 결핍 구조 TiO2-x 박막 트랜지스터에 미치는 급속 열처리 온도의 영향
Han-Sang Kim, Jae-Yun Lee, Sung-Jin Kim
김한상, 이재윤, 김성진
Korean J. Met. Mater. 2019;57(7):438-446.   Published online 2019 Jun 5
DOI: https://doi.org/10.3365/KJMM.2019.57.7.438

We investigated the effect of rapid thermal annealing (RTA) temperature report on oxygendeficient rutile TiO2-x thin-film transistors deposited by RF magnetron sputtering. Amorphous TFTs that use TiO2-x semiconductors as an active layer can be fabricated by low-temperature process and show remarkable electrical performance. The RTA post-annealing process provides greater production..... More

                           Cited By 1
Influence of Film Thickness on the Electrical and Optical Properties of ZnO/Ag/SnO<sub>2</sub> Tri-Layer Films
ZnO/Ag/SnO2 적층박막의 두께 변화에 따른 전기적, 광학적 특성 연구
Yu-Sung Kim, Jin-Young Choi, Yun-Je Park, Su-Hyeon Choe, Young-Min Kong, Daeil Kim
김유성, 최진영, 박윤제, 최수현, 공영민, 김대일
Korean J. Met. Mater. 2019;57(5):324-327.   Published online 2019 May 5
DOI: https://doi.org/10.3365/KJMM.2019.57.5.324

ZnO/Ag/SnO2 (ZAS) tri-layer films were prepared on glass substrates via RF and DC magnetron sputtering, and then the influence of the thickness of the ZnO and SnO2 layers on the optical and electrical properties of the ZAS films was investigated. As deposited ZnO 50 nm/Ag 10 nm/SnO2 50 nm films..... More

                           Cited By 6
Optimization of ZnO/Ag/ZnO Transparent Conductive Electrodes Fabricated by Magnetron Sputtering
스퍼터링법으로 증착된 ZnO/Ag/ZnO 투명전극의 성능 최적화 연구
Woo Hyeon Jo, Dooho Choi
조우현, 최두호
Korean J. Met. Mater. 2019;57(2):91-96.   Published online 2019 Jan 11
DOI: https://doi.org/10.3365/KJMM.2019.57.2.91

The critical role of the thicknesses of the top and bottom oxide layers, as well as Ag layer, in ZnO/Ag/ZnO transparent conductive electrodes were investigated. The Ag forms a nearly continuous layer at the thickness of 8 nm, at which the Ag sheet resistance of 8.0 Ω/Sq. is lower than..... More

                           Cited By 9
Influence of the Thickness of TiO<sub>2</sub>/TiO<sub>2-x</sub> Layers on the Behavior of a Memristor Device
TiO2/TiO2-x 박막층의 두께가 멤리스터 소자의 특성에 미치는 영향
Han-Sang Kim, Sung-Jin Kim
김한상, 김성진
Korean J. Met. Mater. 2019;57(2):84-90.   Published online 2019 Feb 5
DOI: https://doi.org/10.3365/KJMM.2019.57.2.84

Memristors have been extensively investigated as the fourth fundamental circuit element. Titanium oxide is a common material used to fabricate memristors. In this paper, we investigated the influence of the thickness of the oxide active layer on the Al/TiO2-x/TiO2/heavily doped electrode memristor architecture. An insulating TiO2 thin-film was deposited using..... More

                           Cited By 4
Enhanced Electrical Properties and Stability of Solution-processed Amorphous Oxide Thin Film Transistors with Multi-active Layers
Won Seok Choi, Byung Jun Jung, Myoung Seok Kwon
Korean J. Met. Mater. 2018;56(4):304-312.   Published online 2018 Apr 5
DOI: https://doi.org/10.3365/KJMM.2018.56.4.304

We investigated the electrical properties and gate bias stress stability of solution-processed amorphous oxide thin film transistors (TFTs) with multi-stacked active layers. With the multi-layered InZnO (In:Zn = 1:1), mobility was increased from 4.6 to 21.2 cm2V-1s-1 and the subthreshold swing (SS) was improved from 0.71 to 0.54 V/decade compared..... More

High-temperature Corrosion of CrAlSiN Thin Films in N<sub>2</sub>/0.1%H2S Gas
Muhammad Ali Abro, Junhee Hahn, Dong Bok Lee
Korean J. Met. Mater. 2018;56(4):272-279.   Published online 2018 Apr 5
DOI: https://doi.org/10.3365/KJMM.2018.56.4.272

Cr25.2Al19.5Si4.7N50.5 thin films were deposited on steel substrates by cathodic arc plasma deposition. They consisted of alternating fcc-Cr(Al)N/hcp-Al(Cr,Si)N nanolayers. They were corroded at 900 and 1000 oC for 5-100 h in N2/0.1%H2S gas atmosphere. Their corrosion mechanism, the structure of the formed scales, and the role of film-constituting elements during..... More

Characteristics of Al Alloy Powders Prepared by Gas Atomized Method Using Pulsed Current Sintered-Body Process
가스분무법으로 제조된 Al 합금분말의 펄스통전 소결체의 특성평가
Hyun-Kuk Park, Jun-Ho Jang, Jung-Han Lee, Ik-Hyun Oh
박현국, 장준호, 이정한, 오익현
Korean J. Met. Mater. 2017;55(10):703-709.   Published online 2017 Sep 28
DOI: https://doi.org/10.3365/KJMM.2017.55.10.703

In this study, Al alloy targets were fabricated using the powder metallurgy (pulsed current activated sintering, PCAS) process for metal PVD coating target applications. Powders were prepared from Al, Si and Cu ingots for sintering Al alloy compacts using the gas atomizing process. To fabricate the gas atomized Al alloy..... More

Study of Solution-Processed Indium Zinc Oxide TFTs Made by Simultaneous Spin Coating and Ultraviolet Light Irradiation
스핀코팅과 자외선 조사의 동시 적용을 기반한 용액 공정형 Indium Zinc 산화물 트랜지스터 연구
Fei Shan, Sung-Jin Kim
선비, 김성진
Korean J. Met. Mater. 2017;55(8):572-575.   Published online 2017 Aug 1
DOI: https://doi.org/10.3365/KJMM.2017.55.8.572

We investigated solution-processed indium zinc oxide (IZO) thin-film transistors (TFTs) which were fabricated by spin coating with simultaneous irradiation by ultraviolet light. The proposed treatment enhanced the efficient condensation and densification of the oxide semiconducting channel layer by decreasing oxygen-vacancy-related defects and increasing metal-oxide bonds. An IZO TFT irradiated for..... More

High-temperature Corrosion of AlCrTiSiN Film in Ar-1%SO<sub>2</sub> Gas
Poonam Yadav, Sik Chol Kwon, Yue Lin, Shihong Zhang, Dong Bok Lee
Korean J. Met. Mater. 2017;55(4):222-226.   Published online 2017 Apr 6
DOI: https://doi.org/10.3365/KJMM.2017.55.4.222

An AlCrTiSiN film composed of 31Al-15Cr-1.7Ti-0.5Si-51.8N (at%) was deposited on a steel substrate by arc ion plating to a thickness of 1 μm. It consisted of nano crystalline hcp-AlN and fcc-CrN. Its corrosion behavior in Ar-1%SO2 gas at 800 ℃ for 5-50 h was studied. The resulting scales consisted primarily..... More

Enhancement of the Opto-Electrical Properties of Ag Intermediate ZTO Films by Vacuum Annealing
Hyun-Joo Moon, Daeil Kim
Korean J. Met. Mater. 2017;55(3):209-212.   Published online 2017 Mar 3
DOI: https://doi.org/10.3365/KJMM.2017.55.3.209

Sn-doped ZnO (ZTO)/Ag/ZTO tri-layer films were deposited on glass substrates by radio frequency (RF) and direct current (DC) magnetron sputtering and then vacuum annealed at 100, 200 and 300 ℃ for 30 min with a proportions of H2/N2 gas flow of 6/6 sccm, to investigate the effects of annealing temperature..... More

Study of Novel EUV AbsorberNickel & Nickel Oxide
새로운 EUV 흡수체 연구:니켈 & 니켈 산화물
Dong Gon Woo, Jung Hwan Kim, Jung Sik Kim, Seongchul Hong, Jinho Ahn
우동곤, 김정환, 김정식, 홍성철, 안진호
Korean J. Met. Mater. 2017;55(3):198-201.   Published online 2017 Mar 3
DOI: https://doi.org/10.3365/KJMM.2017.55.3.198
The shadowing effect is one of the most urgent issues yet to be solved in high-volume manufacturing using extreme ultraviolet lithography (EUVL). Many studies have been conducted to mitigate the unexpected results caused by shadowing effects. The simplest way to mitigate the shadowing effect is to reduce the thickness of... More
         Cited By 1
Material Analysis & Characterization
Effects of Doping Concentration on the Structural and Optical Properties of Spin-Coated In-doped ZnO Thin Films Grown on Thermally Oxidized ZnO Film/ZnO Buffer Layer/Mica Substrate
Byunggu Kim, Jae-Young Leem
Korean J. Met. Mater. 2017;55(1):67-71.   Published online 2017 Jan 5
DOI: https://doi.org/10.3365/KJMM.2017.55.1.67

ZnO buffer layers were deposited on mica substrates using a sol-gel spin coating method. Then, a thin film of metallic Zn was deposited onto the ZnO buffer layer/mica substrate using a thermal evaporator, and the deposited Zn thin films were then thermally oxidized in a furnace at 500 ℃ for..... More

         Cited By 1
Effect of Post-Deposition Annealing on the Structural, Optical and Electrical Properties of Ti-doped Indium Oxide Thin Films
Sung-Bo Heo, Hyun-Joo Moon, Jeong-Hyeon Oh, Young-Hwan Song, Tae-Young Eom, Jun-Ho Kim, Daeil Kim
Korean J. Met. Mater. 2016;54(10):775-779.   Published online 2016 Oct 5
DOI: https://doi.org/10.3365/KJMM.2016.54.10.775

Ti-doped In2O3 (TIO) thin films were deposited on glass substrates by RF magnetron sputtering. The films were then annealed at 100, 200 or 300 °C for 30 min to investigate the effects of the annealing temperature on the films’ structural, electrical and optical properties. The films annealed at 200 °C..... More

         Cited By 1
Optical Devices & Energy Materials
Synthesis and Photoluminescence Studies of ZnO Films Using Vapor Phase Transport Combined With Rapid Heating
Iksoo Ji, Jae-Young Leem
Korean J. Met. Mater. 2016;54(8):609-614.   Published online 2016 Aug 5
DOI: https://doi.org/10.3365/KJMM.2016.54.8.609

The vapor phase transport (VPT) process is usually used for the growth of one-dimensional nanostructures rather than for film deposition. In this study, for the first time, we report on the fabrication and optical propeties of ZnO film produced by VPT combined with rapid heating. The X-ray diffraction results showed..... More

         Cited By 1
Electronic Materials
Enhanced Optical and Electrical Properties of TiO<sub>2</sub> Buffered IGZO/TiO<sub>2</sub> Bi-Layered Films
Hyun-Joo Moon, Daeil Kim
Korean J. Met. Mater. 2016;54(8):605-608.   Published online 2016 Aug 5
DOI: https://doi.org/10.3365/KJMM.2016.54.8.605

In and Ga doped ZnO (IGZO, 100-nm thick) thin films were deposited by radio frequency magnetron sputtering without intentional substrate heating on a bare glass substrate and a TiO2-deposited glass substrate to determine the effect of the thickness of a thin TiO2 buffer layer on the structural, optical, and electrical..... More

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